Used AXCELIS / FUSION ES3 #293617650 for sale

ID: 293617650
Wafer Size: 12"
Vintage: 2001
Plasma asher, 12" Chiller Pumps Gasboxes EDWARDS IH1800NRV Pump Running time: 10,000 / 12,000 Hours Spare parts: Chamber module Chamber Main PC (3) Microwaves Lampcontroller (75) Lamps Touchscreen SMC Foreline valve Throttle valve 2001 vintage.
AXCELIS / FUSION ES3 is a high performance, reliable asher/etcher for microelectronic device manufacturing. The equipment features a single loadlock and a high reliability wafer handling cassette system to deliver the highest-definition etch and ashing processes. This unit uses a sophisticated beam beamline control machine for precise positioning of focus and beam alignment, providing uniformity and layer control for the etching and ashing control requirements of today's most advanced devices. FUSION ES3 etcher/asher chamber is designed for high wafer throughput, with the ability to process up to 30 wafers at a time. It features a fast switching time and fine adjustment of the focus and beam for superior repeatability. The beam beamline control tool is self-adjusting and well-suited for multilevel etching and ashing, with both convex and concave profile control and uniformity and sharp edge control. The asset has the ability to etch and asher aluminosilicate glass, quartz, SiC and SiG, with standard processes such as PLD, IPD, and PECVD available. The chamber has an isolated substrate bias to minimize shot noise, reduce particle charge accumulation, and improve nanometer control and uniformity. The model also includes advanced features such as variable chamber temperature control and ejection control, to ensure the highest quality etch patterns. AXCELIS ES3 uses the latest high-power radio frequency generator, providing stable output with high density capacitive matching, for high-performance and high-yield within its etching and ashing processes. The RF generator and chamber are designed to prevent hot spots and provide high homogeneity, allowing for quicker runs and higher yields. ES3 etcher/asher is designed for maximum yield, with its reliable and proven wafer handling cassette and low-cost, uniform etching processes. Its suite of advanced features, combined with its fast switching time and precise beam control, makes this equipment ideal for the most advanced microelectronics devices.
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