Used AXCELIS / FUSION ES3 #293802351 for sale

AXCELIS / FUSION ES3 etcher / asher is an integrated solution that provides state-of-the-art technology for plasma etching, plasma ashing, and other related processes. It is a combination of FUSION RF generator, the renowned platform to control process chemistry, and FUSION ES3 etcher/asher chamber. AXCELIS RF generator boasts 300 MHz pulsed RF sources for etching and/or ash processes. It features a wide range power and time control modes that enable precise control and uniformity of the process. The RF generator is also equipped with an innovative dual-frequency control equipment that can be configured to control power in two independent frequency bands. This feature ensures optimized process uniformity and enables the generator to react quickly to any changes in process conditions. AXCELIS ES3 etcher/asher chamber is a combination of two process chambers and an integrated transfer system. The etcher chamber features time-controlled processes and a large gas flow capability that provide excellent control over the etching process. The asher chamber uses dynamic oxidation in an oxygen atmosphere to achieve rapid removal of organics on the wafer. It is designed with an expansion port which allows for future flexibility and expandability. The integrated transfer unit consists of a robot arm and a shuttle which are designed to ensure high throughput and productivity. ES3 etcher/asher is a reliable and powerful machine that enables consistent, uniform results for both etch and ash processes. It features an intuitive user interface which makes it easy to use and helps to maximize productivity. The dual-frequency control tool ensures precise control of the process and enables precise etching and ashing at low cost. This integrated solution offers users a complete etching/ashing solution, providing them with everything needed to achieve superior results.