Used AXCELIS / FUSION ES3i #293802266 for sale

AXCELIS / FUSION ES3i is a high throughput, dual-beam etcher/asher equipment that provides reliable, repeatable results in the semiconductor manufacturing industry. It is capable of etching and ashing silicon, compound, and non-silicon based materials. It uses an inductively-coupled plasma (ICP) source to provide a very narrow and deep etch, and also has a resist strip mode for fast removal of resist and passivation layers. The system can achieve etch and ashing depths of up to 50µm in one pass. FUSION ES3i has a dual-beam architecture that enables the simultaneous etching and ashing of two wafers in the same chamber, for increased throughput. It employs an RF plasma source, source power ramping, and a predictive ion energy controller unit which eliminates the need for end-point detection and ensure consistently high repeatability and accuracy. The machine uses a sophisticated user interface, with support for smart technologies to optimize every step of the process, as well as integration of output data into the host tool controller. AXCELIS ES3i is a scalable platform, providing high process flexibility and enabling multi-wafer etch and ashing recipes. For example, it can be configured to use different gases in a single process chamber, to process wafers with heated and cooled PECVD, or to automatically switch between two wafers when the first one is complete. It also has a high precision endpoint detection asset for monitoring critical process parameters, as well as an array of preventive maintenance options, including over-pressure, over-temperature, and loss of vacuum protection. In addition, ES3i offers advanced data management options that enable users to monitor, review, and report on process results. It is designed to provide real-time feedback, with automated alarms in case of process deviations, and the ability to store up to 30 recipes for future use. Last but not least, it comes equipped with a 98% clean chamber design, reducing particle contamination, and a dedicated port for gas connection, which simplifies setup, maintenance and performance optimization.