Used AXCELIS / FUSION G03 #9261541 for sale

AXCELIS / FUSION G03 is a high-performance electrochemical etching/plasma ashing equipment used in the semiconductor industry. It is designed for the production of wafer-level and die-level devices in the semiconductor industry. FUSION G03 offers the ultimate precision and control required for etching high-density, high-precision, and high-performance features on semiconductor surfaces. AXCELIS G03 is a highly flexible system with several advantages in terms of cost, flexibility, compatibility, and productivity for many different semiconductor processes. It is designed for multi-layered photoresist masking and patterning with options for fast ashing of both negative and positive photoresist films. G03 has built in variable power settings that allow for precise etching depths and can be adjusted for different resistivities while the RF bias power ensures complete etching of all types of materials from low to high resistivity. AXCELIS / FUSION G03 is designed to provide uniform, high-quality etching and ashing results in high yields and with excellent throughput. Its operation is controlled by a high-performance control unit and its etching process can be adjusted for different wafer and die sizes. FUSION G03 is equipped with an electronically tunable oscillator for precision etching, a variety of internal and external gas distribution systems for enhanced controllability, and a sophisticated user interface for easy operation and monitoring. It also provides a wide variety of precise etching configurations including multiple layer etching and multiple mask strategies. AXCELIS G03 has a wide range of safety features such as auto-shutdown, an emergency stop switch, forced ventilation, and other features designed to protect operators from potential hazards. It also includes a preconfigured DMA scheduler and a built-in alarm machine for efficient etching operations. Overall, G03 is a reliable and dependable etching/plasma ashing tool that ensures precision etching with fast processing times and excellent productivity. It is designed to maintain high quality etching profiles for a wide variety of substrates and fulfills all the requirements of the semiconductor industry.