Used AXCELIS / FUSION Gemini GES #293654522 for sale

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ID: 293654522
System (2) Chambers.
AXCELIS Gemini GES is an cutting-edge etcher / asher specifically designed for deep-submicron semiconductor processing. It offers unprecedented capabilities for etching and ashing a variety of material substrates, including silicon, germanium, indium phosphide (InP), gallium arsenide (GaAs) and titanium-silicon oxynitride (TiSiOX). Gemini GES is a highly versatile equipment that supports a full suite of applications, from 1xnm to 90nm. AXCELIS Gemini GES is based on a dynamic dual-chamber parallel plate architecture, which provides excellent temperature and gas distribution stability, as well as sub-angstrom precision control. Its two independent chambers allow for both high-density plasma etching and high resolution particle-beam ashing. This system is capable of processing wafers up to 12" in diameter, and has a patented high-throughput transfer mechanism that maximizes productivity. Gemini GES also features a robust safety unit that serves to maximize operator safety and environmental compliance. It is equipped with features such as smart clean and zero-suface open source systems, and continuous monitoring of operator exposures to hazardous materials. AXCELIS Gemini GES is designed to meet the needs of both production and research and development divisions, with excellent process repeatability and throughput. The machine uses an automated process recipe generator and an intuitive display that guides users through the etching and ashing processes. In terms of hardware, the tool is capable of performing a wide range of processes, including etch, etch-strip, and moisture removal. It houses multiple plasma etching and ashing chambers, as well as process gas and etchant/stripper delivery systems that enable a wide range of applications. Gemini GES also features a powerful software suite, known as the Process Agent. This software provides advanced control functions, such as wafer patterning, line-edge-roughness measurement, and process feedback. The integrated data logger and expert asset provide rapid feedback and data management tools to monitor process trends. The Advanced Contact-less Chamber Model ensures accurate and repeatable plasma coverage, while an integrated particle-injection chamber provides pinpoint control over resist strip direction and accuracy. AXCELIS Gemini GES is the market-leading etcher / asher and offers unparalleled performance, efficiency, and reliability in semiconductor processing. It is an essential tool for modern wafer fabrication, and provides the capability to influence tomorrow's designs.
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