Used AXCELIS / FUSION Gemini PCU #9258508 for sale

AXCELIS / FUSION Gemini PCU, often referred to as FUSION Gemini PCU, is an etching and ashing tool that uses plasma-enhanced chemical vapor deposition (PECVD) to deposit and etch a variety of materials. AXCELIS Gemini PCU allows for high-precision etching and ashing on a variety of substrates. It is a top choice for etching and ashing in the semiconductor industry, as it offers great resolution and repeatability. Gemini PCU works by using low-voltage, high-power radio-frequency energy to generate a few hundred watts of power in a low-pressure environment. This environment is used to facilitate the deposition of a layer of material for the etching process. The etching process is then accomplished by passing the material through another chamber filled with plasma, in which the material is bombarded and etched away. The plasma generated in this chamber is monitored and controlled by several sensors and other electronic components. The etching process is done in two stages: the initial etch and the post-etch. The initial etch uses a bias voltage to etch away the material layer deposited by the PECVD. This material is etched away in a shape that is determined by the pattern etched onto the substrate. The post-etch process uses a higher-power ion beam to further etch the shape of the pattern into the substrate. This is accomplished by using a calibrated etch strategy developed by the manufacturer. AXCELIS / FUSION Gemini PCU is capable of etching and ashing a wide range of materials such as copper, aluminum, tin, tungsten, glass, and silicon. This makes it a great choice for applications where complex etching patterns and ashing requirements are involved. It is also highly repeatable, meaning any given substrate will maintain the same etching and ashing results each and every time. FUSION Gemini PCU is considered to be a reliable and powerful etching and ashing tool. Its ability to produce high-quality, precise, and repeatable results make it the ideal choice for etching and ashing in the semiconductor industry. Its accuracy and reproducibility also make it suitable for a variety of other applications where etching and ashing is required.