Used AXCELIS / FUSION Integra #9201835 for sale
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AXCELIS / FUSION Integra is a highly advanced etching and ashing equipment designed for high-volume processing in the semiconductor manufacturing industry. This advanced system combines both plasma etching and furnace ashing with the flexibility to allow for multiple functions in one unit. The machine is highly reliable and efficient, easily meeting the demands of the most sophisticated semiconductor manufacturing processes. FUSION Integra is capable of processing a variety of wafer sizes and is adept at performing up to 6 etch and 4 ashing operations simultaneously. The tool is constructed with an 50" (1270mm) ICP source and multi-zone isolation chambers to provide stable operation for long duration processes. It has a high throughput capacity of up to 75 wafers per hour for etch processes and up to 25 wafers per hour for ashing. The asset also features a dual chiller cooling model to improve performance and reliability, as well as a precision velocity generated inert gas delivery equipment to ensure consistent gas pressures throughout the process. AXCELIS Integra features an intuitive, user-friendly interface with the ability to store up to 50 recipes for quick and easy access. The system also has a powerful and highly efficient control unit with tuned PID algorithms that provide flexible, accurate, and repeatable process control. The machine also features a precision cleaning station to allow for easy and effective cleaning of tool components between processes. To ensure the safety of personnel, Integra has a number of built in safety features. The asset is equipped with interlocks to prevent accidental start-up or shut-down of the process, flame detection systems to ensure safe, operation, and emergency shut-off capabilities. Overall, AXCELIS / FUSION Integra is an advanced model ideal for etching, reactive ion etching and ashing processes. This equipment provides a reliable, efficient, and easy-to-use solution, not only meeting, but exceeding the demands of the most demanding semiconductor processing requirements.
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