Used AXCELIS / FUSION MTL-200A #9083200 for sale

AXCELIS / FUSION MTL-200A is an advanced Plasma Etcher/Asher designed and manufactured by FUSION Technologies Inc. that enables the semiconductor industry to process complex, delicate structures with precision and accuracy. This latest model, FUSION MTL-200A, is designed for use in a wide range of processes including etching, ashing, dopant implantation, and other wafer surface treatments and modifications. AXCELIS MTL-200A plasma etcher/asher features an advanced multi-station configuration for optimized use and flexibility. MTL-200A can process both single and double-sided wafer configuration, allowing for processing of multiple wafers simultaneously for added efficiency and throughput. In addition, AXCELIS / FUSION MTL-200A features an advanced dual-mode plasma source with embedded precision angle wedged electrodes for controlling both etching and ashing processes. The sophisticated plasma source enables deep, uniform etching in very delicate structures without damaging the wafer's surface. Ashing, on the other hand, operates with precision between the etched features, creating a clean wafer surface for subsequent wafer processing. FUSION MTL-200A's superior design also ensures accuracy and repeatability in etching process parameters, such as temperature, pressure, and gas flow. The plasma power supply coupled with the gas delivery system offers a high degree of control to ensure optimal conditions for etching and ashing. In addition to its powerful plasma technology, AXCELIS MTL-200A's advanced software system allows for a high degree of process control and tracking. The software includes advanced mapping and diagnostics capabilities for full process monitoring and analysis as well as optional APC/EPC capabilities. These features enable users to monitor all operating parameters during process cycles, analyze details of each etch/ash process, and optimize recipe parameters for enhanced output and yield. In conclusion, MTL-200A Plasma Etcher/Asher from AXCELIS is a powerful and efficient tool for the semiconductor industry. Its advanced multi-station configuration, sophisticated plasma source, and superior software system combine to provide precise, repeatable, and uniform etching and ashing with superior yield.