Used AXCELIS / FUSION RapidStrip 320 #9252297 for sale
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ID: 9252297
Wafer Size: 12"
Vintage: 2002
Stripper / Asher, 12"
Chamber type: DRM
Frequency: 13.56 MHz
Maximum power: 5000 W
Temperature range: 30°C ~ 80°C
Gases:
Ar (754)
C4F8 (43)
O2 (46.8)
O2 (1215)
CF4 (336)
CHF3 (163)
CH2F2 (144)
N2 (300)
CO (500)
2002 vintage.
AXCELIS / FUSION RapidStrip 320 is an etcher and asher that is used in industries such as electronics, automotive, biomedical, and nanotechnology. The etcher and asher offer outstanding performance when it comes to the disassembly of a wide range of substrates, including metals, dielectrics, and organics. FUSION RapidStrip 320 delivers unmatched productivity and offers a scalable platform that enables users to increase throughput without compromising quality. AXCELIS RapidStrip 320 is equipped with a vacuum chamber, which provides a controlled and contaminant-free processing environment for materials to be processed. It is capable of handling large substrate loads, with the capability of processing up to 200 mm wafers. The vacuum chamber is used to hold the substrate in place, while an effluent collector traps any material that is removed during the etching process. The chamber is also equipped with an electrostatic chuck (ESC), which is responsible for ensuring in-situ electrode supply. The ESC also eliminates any chance of the material moving while processing, further increasing accuracy and throughput. RapidStrip 320 offers a wide range of etching capabilities, including but not limited to: deep silicon-based etching, selective removal of thick or very thin layers of material, and optimized etching of alternating metal layers. Its patented cold-plasma technology reduces substrate damage and ensures uniform etching due to improved ion-energy distribution. The asher of AXCELIS / FUSION RapidStrip 320 is used to achieve an even deposition of photoresist for material patterning. This allows users to achieve fine patterning for memory and processor packages. The asher has an easy-to-use GUI that lets users set recipes and program substrate transfers. FUSION RapidStrip 320 provides superior performance in both etching and ashing capabilities. It can quickly and accurately disassemble a wide range of materials, deposit photoresist for patterning, and perform processes that require precise control. With its efficient vacuum system, large substrate loads, and patented cold-plasma technology, AXCELIS RapidStrip 320 is a reliable and cost-effective solution for an array of industries.
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