Used AXIC HF-8 #9124396 for sale

AXIC HF-8 is an etcher and asher designed for use in the semiconductor industry. The device is suited for applications such as plasma etching, oxidation, dopant diffusion, and material surface etching. It features a 5-Zone thermal mass flow control, an in-situ ozone monitor, and a built-in interface. The thermally insulated etching chamber is constructed of stainless steel and is self-contained to prevent potential contamination. The chamber is equipped with a diamond plasma source to provide maximum arc stability and uniform plasma distribution. An automated quartz loadlock chamber is also included and allows for controlled entry and exit of substrates. AXIC HF8 offers a wide range of process parameters including thermal rapid uniformity and uniform process depth. These parameters can be adjusted for best results depending on the desired application, ensuring repeatability and increased process yields. The in-situ ozone monitor allows for automated control of the metering and removal of ozone to maintain the optimal process environment. The unit includes a built-in interface, providing an easy-to-use graphical user interface that allows operators to precisely adjust process parameters. A variety of recipe storage functions and data logging capabilities are also included. HF-8 system can be connected to a remote computer for convenient data transfer, enabling monitoring and analysis of process parameters. HF8 is a versatile system that can be used in a variety of industries, including semiconductor, solar, and medical device manufacturing. Its size and efficient design make it suitable for cleanroom environments due to the low outgassing emission levels. The system's automated operation and built-in interface helps to ensure repeatability, accuracy, and reliable process results.