Used AXIC Multimode HF-8 #60542 for sale
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ID: 60542
Plasma processing systems
For anisotropic and / or isotropic etch
System 110 V, 60 Hz, 15 Amps
220 V, 50/60 Hz, 7 Amps
Pump 110V, 60Hz, l0Amps or 220 V, 50/60 Hz, 6 Amps
H2O For Electrode Cooling [Electrode Dependent]
Air For Valve Operation
N2 For Chamber Vent
Gas Process Gasses.
AXIC Multimode HF-8 is a state-of-the-art etcher and asher for use in various research and engineering applications. It is designed for etching, ashing, and lithography on wafers up to 8 inches in diameter. The device offers high throughput with good process quality and reliability, thus making it ideal for industrial and research applications. The equipment is based on a reactive ion etching (RIE) technology and features a vacuum chamber as well as a number of ancillary components. Its base system consists of a vacuum chamber, RF power generator, control unit and etching/diffusing source. The standard sample size is 150x150x0.25 mm and the device is compatible with most types of plastic, metal and quartz substrates. Additionally, it can etch and asher substrates with small feature sizes of up to 1 micron. The main components of Multimode HF-8 include several different types of plasma sources, such as inductively coupled plasma (ICP), reactive ion etching (RIE) and laser ablation sources. These sources offer a range of etching and diffusion processes to enable custom processes for different applications. Possible operations with AXIC Multimode HF-8 include etching of structures, upper and middle layer lithography, diffusion and ion implantation. The device comes with several safety features, like over temperature protection and gas leak detection. It is also equipped with a computerized control machine, which enables automatic and fine-tuned process control. The software package allows for customization of the etching and lithography recipes, thus providing greater process flexibility. Multimode HF-8 offers a powerful and versatile tool for etching, ashing and lithography. With its advanced Plasma sources, reliable control tool and a range of safety features, it offers fast and reliable processing while providing good process quality. It is suitable for industrial and research applications, making it one of the best etchers and ashers available on the market.
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