Used BALZERS / UCP LFC 150 #293799927 for sale

BALZERS / UCP LFC 150
ID: 293799927
Plasma cleaner.
BALZERS / UCP LFC 150 is a specialized etcher/asher equipment used in the semiconductor and microelectronics industry for plasma cleaning, etching, and surface modification processes. This advanced equipment is designed to deliver high-performance results with exceptional precision and reliability. UCP LFC 150 features a state-of-the-art vacuum chamber that creates a low-pressure environment conducive to plasma generation. The system is equipped with a high-frequency RF (Radio Frequency) power source that ionizes process gases, creating a plasma that can be used to clean or etch substrates with high uniformity and repeatability. One of the key components of BALZERS LFC 150 is the gas delivery unit, which allows for precise control of process gases and their flow rates. This machine enables users to tailor the chemical reactions occurring in the plasma to achieve specific etch rates, selectivity, and surface properties. The gas delivery tool is equipped with mass flow controllers (MFCs) that ensure accurate and stable gas flow throughout the process. The asset also includes a load lock chamber for transferring substrates in and out of the main processing chamber without breaking vacuum. This feature minimizes contamination and improves process repeatability by maintaining a clean processing environment. The load lock chamber is equipped with a robotic arm or cassette model for automated substrate handling, further enhancing equipment productivity and throughput. In terms of plasma generation, LFC 150 utilizes a dual-frequency plasma source for enhanced process flexibility. The combination of low-frequency (LF) and high-frequency (HF) power excitation allows for control over the plasma density and energy distribution, enabling a wide range of process capabilities such as ashing, descum, isotropic etching, and surface modification. The dual-frequency plasma source also contributes to the system's ability to process different types of substrates and materials with varying characteristics. To monitor and control the etching/ashing process, BALZERS / UCP LFC 150 is equipped with advanced process monitoring and automation capabilities. Real-time endpoints detection, optical emission spectroscopy (OES), and mass spectrometry are some of the diagnostic tools integrated into the unit for process optimization and fault detection. Additionally, the machine can be interfaced with a computerized process control software for recipe management, data logging, and remote operation. UCP LFC 150 is designed with user-friendly features for ease of operation and maintenance. The tool includes a user interface with intuitive controls and graphical display for monitoring process parameters and asset status. Maintenance tasks such as chamber cleaning, electrode replacement, and model calibration are made straightforward with easy access to critical components and service ports. Overall, BALZERS LFC 150 is a versatile and reliable etcher/asher equipment that offers high-performance capabilities for a variety of semiconductor and microelectronics applications. With its advanced process control, automation, and monitoring features, this equipment is ideal for research and development, pilot production, and high-volume manufacturing environments where precision and consistency are crucial.
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