Used BRANSON / IPC 2000 #9009136 for sale

BRANSON / IPC 2000
Manufacturer
BRANSON / IPC
Model
2000
ID: 9009136
Plasma processing reactor center.
BRANSON / IPC 2000 is a high-performance etcher and asher. It is equipped with a unique, patented cleaning equipment that allows it to maintain a high level of accuracy and quality with each etch and ash cycle. With the ability to operate at temperatures ranging from 400°F to 800°F, IPC 2000 is ideal for many industrial applications. The main components of BRANSON 2000 are the etch chamber, ash chamber, and RF RF generator. The etch chamber is constructed with thermally-insulated quartz and has an embedded ring heater to maintain desired process temperatures. In addition, there are ion gauges to measure the chamber pressure, a gas supply control to manage the gas content in the chamber, and a thermocouple to measure the substrate temperature. The etch chamber is large enough to process wafers up to 6 inches in diameter. The ash chamber has a unique, rotating basket design to help ensure uniform ashing. The RF generator is dual-frequency and includes a frequency switcher to adjust the process parameters, such as the etch or ash rate. The process rates can be adjusted in both time and power to meet desired specifications. 2000 also includes multi-zone pressure control, oxide-etch-overspray protection, and a dedicated filter system, all of which help maintain unit cleanliness and ensure repeatable results. The machine can also perform ultra-precise depth etching with minimal heat and minimal requirements for additional post etch and ash cleaning. Overall, BRANSON / IPC 2000 provides a reliable, repeatable, and accurate etching and ashing process. It has the ability to work on most substrates, including glass, metal, ceramic, and silicon. This makes it ideal for automotive, electronics, aerospace, and semiconductor industries.
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