Used BRANSON / IPC 3100 #9201709 for sale
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ID: 9201709
Wafer Size: 6"
Asher, 6"
Plasma systems: Low pressure
Gaseous plasma: Low temperature
Plasma treatment chambers
Plasma reactions:
Ashing
Etching / Polymer
Surface modification: Quickly / Reproducibly
RF Electrical power
Control: Reactant plasma gases.
BRANSON / IPC 3100 is an Etcher/Asher that is designed to deliver precise and repeatable process results. This is especially important for industries where precision process control is necessary. It features an advanced microprocessor combined with an intuitive Windows user interface that makes operating the equipment easy. The instrument is also equipped with a real-time clock, a controller, and a dual-function gas flow controlled heated chamber. IPC 3100 has a powerful 810kHz RF generator that is ideal for a variety of etching processes. The system is capable of performing both directional arcs and the more difficult underlying arcs necessary for precise process control. The unit also features advanced process monitoring capabilities,including automated narrow process windows. This provides users with greater control over increasingly stringent process parameters. The hardened and sealed chamber of BRANSON 3100 is designed for clean horizontal operation. It also features quartz wall inserts that can be used to reduce contamination and to increase productivity. The controlled atmospheric environment of the quartz walls ensure repeatable plasma etch processes. This also eliminates the need for external gas supply systems, allowing great flexibility and process control. The instrument is controlled with an intuitive Windows user interface that is easy to use even for inexperienced operators. The machine also includes a number of self-diagnostics and automated processes to ensure maximum process control and reliability. 3100 is an ideal choice for precise and repeatable process results, especially for industries that require precision process control.
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