Used BRANSON / IPC 4155/2 #9194688 for sale

ID: 9194688
Vintage: 1989
Plasma etchers 1989 vintage.
IPC 4155/2 etcher/asher is an advanced dual-flightzone equipment that provides superior accuracy in processing silicon wafers, photomasks, and other substrates. The 4155/2 is an all-in-one system that includes both an ultra-clean etcher and a high-density asher in one unit. BRANSON 4155/2 etcher is capable of producing results with accuracy levels of ±2 microns. It uses a 192 nozzle precision etch nozzle with advanced scrubbing capabilities for optimal sub-surface preparation. The etcher can be used with both wet and dry etch methods depending on the specific application. The etch options are capable of processing with varying etch cycles that achieve feature resolution within the etched film thicknesses. BRANSON / IPC 4155/2 asher is capable of processing substrates with superior accuracy and process uniformity. This asher unit delivers uniformity of greater than +2.0 microns, with a maximum accuracy of ±2.0 microns. All ashing processes can be optimized with the 4155/2's innovative control algorithm. The advanced machine also provides a range of ashing intensities and temperatures that can be used for both low and high temperature processing. The user-friendly IPC 4155/2 etcher/asher delivers maximum performance when processing silicon wafers, photomasks, and other substrates. Its unique dual-flightzone tool provides unprecedented accuracy and control level, even when processing complex patterns or features. With its accurate etching and ashing functions, BRANSON 4155/2 is the ideal machine for any surface processing application.
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