Used BRANSON / IPC RIE #161812 for sale

BRANSON / IPC RIE (Reactive Ion Etching) is an etcher/asher for fabricating semiconductors and microelectromechanical systems (MEMS). It is a high-precision plasma etcher with a wide range of sensitivity, high throughput and low cost of ownership. IPC RIE works by depositing plasma generated by RF Energy onto the substrate surface where it rapidly etches micro-features into the material. BRANSON RIE is equipped with a 3.5 kHz to 130 MHz frequency range and offers a wide range of gas types, RF control and process control capabilities, allowing for precise and repeatable results. RIE utilizes a chamber vacuum of 0.5-100 mTorr, with each chamber capable of reaching a vacuum of 10-5 and 10-6 Torr which is sufficient for precision etching and deposition. The chamber is capable of processes down to 25 shots and can be run in various modes such as Argon, CF4, Cl2, O2, and specialized etc. BRANSON / IPC RIE also features an integrated MCMT process which has the capability to etch via sequential and simultaneous bi-directional etching. This allows for improving profile control, process repeatability and extremely fast processing times, while maintaining fine feature resolution and surface finish. IPC RIE also offers an adjustable pressure control system which allows for easy adjustments with minimum effort. BRANSON RIE is a reliable and robust etcher that can be used for a wide range of applications such as depositing thin films and MEMS devices, etching trenches, grooves and vias and etching other materials including sapphire, aluminum and silicon, allowing for the fabrication of intricate and high-precision devices. RIE is user-friendly and offers a wide range of technological advantages compared to wet etching systems. In summary, BRANSON / IPC RIE is a high-performance etcher/asher that is used for fabricating semiconductors and MEMS. It provides users with a wide range of features and process control capability, including the ability to etch and deposit using a variety of gas types and RF control. It also offers fast processing times, repeatability and adjustable pressure control, making it the perfect tool for many different applications.