Used BRANSON / IPC S3003c #9056164 for sale

BRANSON / IPC S3003c is a versatile plasma etching and ashing instrument that offers high quality results while providing ease-of-use and a performance that is reliable and cost-effective. IPC S3003c is designed with a stainless steel multi-chamber plasma etching and ashing chamber to handle a variety of substrates and plasma treatment. It offers both gas-phase and chemical plasma etching and ashing capabilities. The instrument has a built-in turbo pump that can be used to regulate the pressure within the chamber, allowing for precise control over the plasma etch and ashing process. The instrument is designed with a programmable power supply for precision etch control across a wide range of etch conditions. Different substrate types require different etch conditions to deliver the best results. BRANSON S3003c offers a wide range of settings to access the optimal etch times and pressures for various substrate types. The etcher/asher also features an electrical bias and microwave-assisted plasma (MAP) subsystem. This combines the advantages of both conventional and RF-plasma etching for improved precision and etch quality. The electric bias increases ionization and reduces surrounding field distortions to improve the accuracy and precision of the etch. While the MAP subsystem extends the plasma species to include higher molecular weight species and radicals, resulting in improved etch uniformity and selectivity. S3003c also comes equipped with an automated load-lock process and temp-control chamber. These two features work together to provide a rapid loading and unloading of substrates into the etching chamber and a controlled environment for the etch process. The load-lock process allows for multiple substrates to be loaded and unloaded in batches without compromising etch quality, while the temp-control chamber ensures the substrate and plasma remain at a constant temperature throughout the etching process. Finally, BRANSON / IPC S3003c comes with a graphical user interface (GUI) which provides an easy and intuitive way to monitor and control the etching process. The GUI also provides users with access to various process parameters and allows for the adjustment of settings according to their requirements. IPC S3003c plasma etching and ashing system is an industry-leading instrument, offering quality, reliability, and performance. It is perfect for etching and ashing a variety of substrates and offers users precise control over the etch process, as well as features like automated loading and unloading, temp-control chamber, and graphical user interfaces. It is an ideal choice for those who require high quality and cost-effective etching and ashing solutions.