Used CANON / ANELVA 4100 #9210331 for sale

CANON / ANELVA 4100 is a dry, radio frequency etcher and asher equipment used for the precise etching and ashing of semiconductor devices. The system operates at a frequency of 13.56 MHz, and can be used to conduct a range of etching and ashing processes such as SiO2 stripping, oxide aperture opening, oxide side wall and bottom etching and FGA decapsulation. It is designed to enable high throughput of applications, and is typically used in the manufacturing of semiconductor devices. CANON 4100 has a compact design with a low-profile, side-paneled body, ideal for chip-scale etching applications that require high precision. It also features a full work deck for loading and unloading parts, and can control up to 8 separate etching zones for improved process efficiency. Additionally, the unit is equipped with four temperature control stages that allow users to preheat and cool the substrate to a specific temperature prior to etching or ashing, while its modular process control panel makes it easy to adjust and monitor process parameters. ANELVA 4100 contains several process monitoring features, including an in-situ detection machine for current and voltage, gas flow sensing, and temperature monitoring. This helps to ensure that all processes are conducted accurately, and that the etched device achieves desired results. Additionally, the tool has a number of safety features, such as an RF shield chamber for preventing RF radiation from the process chamber, and an in-situ RF supervisor for detecting any possible RF leakage. 4100 is a versatile, reliable asset capable of delivering reliable, high-precision etching and ashing of semiconductor devices. Its low-profile design and in-situ process monitoring features ensure precise control and monitoring, while its modular process control panel and four temperature control stages allow users to customize etch and ashing parameters for their application. This model is an ideal tool for fabricating semiconductor devices with a high level of accuracy and efficiency.