Used CANON / ANELVA DEM-451 #9055187 for sale

CANON / ANELVA DEM-451 is a wet etching and ashing dry etcher used for processing microscale surfaces and materials. It features two different processing units which are ideal for a variety of applications and materials, such as substrate preparation, device fabrication, microcontact printing, and 3D printing. The wet etching unit features a slurry tank and a variable-pressure pump. This unit allows for a uniform pressure over the entire etched area, enabling higher precision and accuracy. The slurry tank can be loaded with a variety of mixtures such as KOH, TMAH, and HF solutions, as well as with customized reactants. The liquid flow rate and pressure can both be adjusted to achieve the desired etching parameters. The etch rate can be monitored automatically with the on-board PC. The ashing dry etching unit of CANON DEM-451 is comprised of a vacuum chamber and several plasma sources. The vacuum provides a clean and stable environment for the ashing process. The plasma sources generate a focused and uniform plasma which is on demand, allowing for perfect ashing results. The ashing process parameters are customizable to match the material to be processed. These parameters include etch rate, time, and type of gas used, such as oxygen, argon, helium, or CF4. This advanced etcher is designed for batch processing and can handle up to 19 wafers simultaneously. ANELVA DEM-451 is a versatile and precise tool for etching and ashing microscale surfaces and materials. It features a reliable and robust design, providing excellent performance in demanding microprocessing applications. The user friendly control system provides an intuitive interface and process automation. Its powerful functionality, flexibility, and precision make it an ideal choice for substrate preparation, device fabrication, microcontact printing and 3D printing.