Used CANON / ANELVA ECR-300E #9380734 for sale

CANON / ANELVA ECR-300E is a state-of-the-art etching and ashing equipment designed for high performance semiconductor device production. It is a compact and highly efficient system equipped with a wide range of standard features and options, including advanced plasma source technologies. CANON ECR-300E offers optimized sputter processes with outstanding uniformity and repeatability, ensuring high-the best quality and productivity levels. ANELVA ECR-300E offers up to 600mm wafer compatibility and has a unique five-level flat wafer transport unit which is capable of carrying wafers through independent process chambers without the need for manual intervention. The wafer transport machine is designed to provide maximum process reclamation and prevent wafer damage or contaminate due to over-processing. The multi-process chamber architecture also offers dynamic wafer control throughout the sputtering process, enabling dynamic optimization of the ion bombardment angle and substrate biasing. In addition, ECR-300E features a configuration of ultra-high-frequency ranging up to 200MHz, as well as a number of advanced sputtering source options, including magnetron (DC and RF) and extreme-high-density plasma (EHD) multi-target sources. CANON / ANELVA ECR-300E is capable of producing monochromatic or polychromatic films using one or two sources at the same time, and can also handle plasma doping applications. The tool further includes multiple process control and monitoring functions, allowing for precise control of process parameters such as process pressure, temperature, and power. CANON ECR-300E features a unique two-stage liquid flow cooling asset which provides optimal process temperatures and can be used for low temperature and low temperature annealing. The model also offers closed-loop cooling for greater precision control, as well as an automated recipe management equipment for easy process setup. In addition, ANELVA ECR-300E boasts high-performance automatic gas control functions enabling high-precision quality control. ECR-300E is designed to meet the highest industry standards for optimum performance and reliability over many years of operation. The system is also backed by a full range of service and support, including spare parts, maintenance contracts, and comprehensive technical support. CANON / ANELVA ECR-300E is ideal for all high-security etching and ashing processes, providing quality and efficiency for a variety of semiconductor device manufacturing applications.