Used CANON / ANELVA I-2100 #293754407 for sale

CANON / ANELVA I-2100 is an etcher/asher model manufactured by CANON and ANELVA, Inc. CANON I-2100 is an advanced, high-performance etcher/asher equipment. This model is used in the production of Si microfabrication. It utilizes a plasma generator, vacuum chamber, and an exhaust blower to etch circuit patterns on the surface of Si integrated circuits (ICs). Additionally, the system is capable of ashing the undesired surface materials, such as photoresist residue, organic contaminants, and other unwanted residues. ANELVA I-2100 utilizes a dual-plasma generation unit to maximize both sputter and etching capabilities. In the etching process, the ionized plasma causes surface pattern formation on the Si. This process effectively removes the target layer, and the remaining residues are then ashed or buried off the surface. The machine utilizes four external gas sources, a high-temperature up to 715 Celsius, and a chamber pressure of up to 1,000 mbar, enabling it to etch even the toughest Si-based materials. Additionally, the tool possesses an adjustable RF duty cycle as well as additional features for allowing multi-stage processes. I-2100's computerized PC control center provides a way to monitor etching and ashing performance, and allows users to control the asset parameters in order to optimize etching and ashing performance. CANON / ANELVA I-2100 etcher/asher model is an ideal tool for rapid prototyping, feature density enhancement, and MEMS fabrication. Its robust performance, advanced etching and ashing capabilities as well as adjustable parameters make it a favorite among engineers and designers. With its advanced PC control center and multiple gas sources, it can easily be integrated with other systems and processes for maximum efficiency.