Used CANON / ANELVA I-42230 #9236119 for sale

CANON / ANELVA I-42230 is a Metal Plasma Ion Etcher/Asher Tool for wafer preparation. It is designed for in-situ etching, cleaning and stripping of metals such as aluminium, copper and gold on a variety of wafer substrates. CANON I-42230 has a single chamber configuration with vacuum and gas supply, multi-height wafer manipulators, and a high-vacuum Metal Plasma Source (MPS). The MPS features an anode and two rings of electrodes powered by capacitors, creating an ion beam for etching. The anode is made from highspeed tungsten wire, and the two rings of electrodes consist of aluminium shell and copper ring. ANELVA I-42230 is capable of etching metals and metal-oxide from the wafer surface, clean metal surfaces, and strip metals from the wafer. It is suitable for a wide range of process parameters and conditions. I-42230 is equipped with a variable mass flow controller, which allows precise control of etching and cleaning processes. CANON / ANELVA I-42230 has an etch time ranging from about one to several minutes depending on the process, wafer surface area, and film thickness. It can also be used to treat wafers that are thicker than about four micrometers. It has a maximum etch rate of up to 1.0 µm/min, and a maximum process temperature of 500°C. CANON I-42230 features a vacuum range of 50 to 8 x 10-5 Pa. It is capable of up to two process gases, either nitrogen and oxy-hydrogen or argon and oxy-hydrogen. It has a power consumption of 12 kW for etching and 36 kW for ashing processes, as well as a process pressure range of 0.3 to 30 mbar. For safety purposes, ANELVA I-42230 has a fire alarm system with sensors which monitor gas flow and process conditions. The system is connected to the central control system which warns of any danger. I-42230 also features an emergency stop switch and a ground fault isolation circuit breaker. CANON / ANELVA I-42230 is easy to set up and operate. It is also highly reliable in performance and is known as one of the most cost-effective plasma etching/asher tools on the market. This etcher/asher tool is ideal for wafer fabrication, MEMS/MOEMS processes, and integrated circuit manufacturing.