Used CANON / ANELVA ILD 1051 #9111593 for sale

CANON / ANELVA ILD 1051 is an etcher or asher that is designed for use in the production of printed circuit boards and semiconductor devices. This etcher features a chemically-assisted ion-beam etcher which utilizes a dual high-powered gas source system to create the etch pattern. The gas source consists of a combination of high-pressure Argon and chlorine (or sulfur hexafluoride). The combination of these gases allows CANON ILD 1051 to create the precise etch pattern required. ANELVA ILD 1051 is equipped with two separate plasma processes for etching, making it one of the most efficient etchers on the market. This etcher makes use of a hybrid deposition process, which combines the use of negative ion plasma processes and physical desorption of the substrate material. This process combines the etching of micro-circuits with the production of nanometer-scale features. The negative ion plasma process allows etching to occur at higher rates than those possible employing physical desorption alone. ILD 1051 utilizes electrostatic focusing to ensure the accuracy of etching operations. This etcher is equipped with a control unit that allows the user to easily adjust the current, voltage, and pulse time for a precise etch rate according to the substrate material type. CANON / ANELVA ILD 1051 has a vacuum chamber in order to prevent contamination during the etching process. This etcher features a programmable electrode configuration, which allows the user to create different etch patterns at differing depths depending on the need. CANON ILD 1051 etcher also features an advanced computer interface which allows the user to customize the operating parameters and keep track of etching activity. This etcher allows for simultaneous etching of multiple substrates. Additionally, this etcher features an interactive graphic user interface, which allows the user to visually monitor the etching progress and make changes to the etching process as needed. ANELVA ILD 1051 is an ideal tool for the production of microelectronic and semiconductor devices. With its high-speed etching capabilities, ILD 1051 can handle a wide variety of materials and is equipped to create precise etch patterns with millisecond accuracy. This etcher is able to produce a variety of geometries, making it well-suited for a variety of microelectronic applications.