Used CANON / ANELVA ILD 1060 #9111594 for sale

CANON / ANELVA ILD 1060
ID: 9111594
Sputtering systems.
CANON / ANELVA ILD 1060 is a high-precision etcher/asher manufactured by CANON Corporation. This equipment provides advanced dry etching and ionized physical sputtering for a wide range of wafer processing applications. The system uses a high-magnification optical unit to precisely focus the ion beam and provide higher processing accuracy with lower substrate damage. The machine is built with an integrated four-axis motion tool with precision linear drive servomotors. It offers an accurate and repeatable etching process to achieve high-accuracy fine patterning. Its Direct Vibration Motion Compensation (DVMC) provides ultra-fine etching with minimal fluctuations in response to external vibration. CANON ILD 1060 is capable of producing ultra-fine patterns on silicon wafers, as it is capable of etching features as small as 2 microns in width and a depth of up to 40 nanometers. The asset can be used for multi-layer processes, as it can etch through different material layers without compromising the integrity of the layers. The model has an automated up/down direction process using the ultra-thin film- etching technology, enabling additional high precision etching, while also reducing uniformity and process wafer damage. The equipment is also capable of dry ashing with an adjustable local heating system, which can provide up to 1000W of power to the substrate surface. ANELVA ILD 1060 is compatible with a range of different process gases, including oxygen, argon, and nitrogen. Its in-situ scrubber particles unit reduces contamination and ensures superior wafer cleaning. The machine also includes an on-site remote interface that allows for remote monitoring and control. In conclusion, ILD 1060 is a powerful and precise etcher/asher tool offering a range of convenient features. Its ability to create high-accuracy fine patterns, coupled with its comprehensive end-to-end remote function, places it at the forefront of dry etching and ionized physical sputtering processes.
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