Used CANON / ANELVA ILD 4002 #9111382 for sale

CANON / ANELVA ILD 4002 is an etcher, also known as an asher, used in semiconductor manufacturing. This machine is a sophisticated, multi-stage reactive ion etcher (RIE) and dry etcher, designed to deposit thin films of dielectric and metal etch components over silicon wafers. It is capable of producing high-resolution, fine-grain features. The machine is controlled by a computer, allowing for precise control of etching parameters. This helps to optimize etching results by limiting the spread of etch damage, the degree of open porosity, and the degree of bottom wall profile. It can also be used to etch 3D structures with zero sidewall bias. CANON ILD 4002 is capable of processing 3, 5 and 8-inch wafers. Its plasma chambers are equipped with secondary electron suppressor (SES) and interference filters to minimize levels of critical surface contamination, which can affect the performance of the etched structure. An automated gauge equipment is included to ensure constant process monitoring, with feedback to the computer system. The unit also features a pressure control regulator and a quartz crystal micro-balances for precise etching. The machine's unique design reduces the time needed for cleaning steps and allows for easy maintenance. This machine is further enhanced with a high-sensitivity thermally controlled tweezers which assists with tight placements of wafers. ANELVA ILD 4002 is also specially designed to ensure maximum safety. Its safety systems include Argon atomizer, safety-controlled signals in case of emergency, and several safety sensors. The exhaust filter maintains particle levels well below threshold limits to ensure a safe work environment. Overall, ILD 4002 is a state-of-the-art etching tool. It is capable of producing tight, small features for increasingly complex micro-fabrication processes. It features several safety and technology features which make it one of the most popular etching systems available for the semiconductor industry.