Used CANON / ANELVA ILD 4015 #9143474 for sale

CANON / ANELVA ILD 4015
ID: 9143474
Wafer Size: 6"
Vintage: 1991
Dry etcher, 6" 1991 vintage.
CANON / ANELVA ILD 4015 is an etcher/asher designed for use in the fabrication of microelectromechanical structures such as microelectronics, sensors, and other high-precision device components. It is an inductively-coupled plasma (ICP) dry etcher/asher with an electron beam source that uses argon and CF4 gases to etch the sample surface in a high-vacuum environment. CANON ILD 4015 is a small, versatile piece of equipment, making it suitable for a wide range of etching and ashing applications. ANELVA ILD 4015 consists of four main components: a sample chamber, a pumping equipment, an electron beam source, and a power supply. The sample chamber is made of aluminum with electrostatic and permanent magnets, and a gas delivery system, which allow for precise control over etching gas distribution. The pumping unit houses both a turbomolecular pump and a mechanical booster pump to achieve a high-vacuum environment for plasma process control. The electron beam source produces a high-intensity electron beam that is used to generate the plasma. Finally, the power supply is responsible for controlling the electron beam energy and for maintaining the plasma. ILD 4015 is capable of etching and ashing feature sizes up to 20 micrometers and can etch metal, silicon, silicon dioxide, and other materials. Its high-vacuum environment eliminates the need for a wet surface passivation step, and its electron beam source allows for low-temperature processing that is free from contamination and damage. Additionally, its gas delivery machine control and surface etch uniformity control features make it suitable for a wide range of process needs. CANON / ANELVA ILD 4015 is also well-suited for a number of characterization techniques, such as secondary-ion mass spectrometry (SIMS) and atomic force microscopy (AFM). Its high-vacuum environment and temperature control enable high-precision etching and ashing of sensitive components, while the electron beam source can be used to perform anion-beam sputter etching and oxidation of the sample. Additionally, CANON ILD 4015 is designed for crosstalk-free experiments, which are necessary in characterization. Overall, ANELVA ILD 4015 is an effective etcher/asher designed for a wide range of etching and ashing applications. Its high-vacuum environment, electron beam source, and gas delivery tool control provide users with precise process control. It is also well-suited for a number of characterization techniques, making it an excellent tool for fabricating high-precision device components.
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