Used CANON / ANELVA ILD 4015 #9257789 for sale

CANON / ANELVA ILD 4015
ID: 9257789
Wafer Size: 6"
Vintage: 1991
Dry etcher, 6" 1991 vintage.
CANON / ANELVA ILD 4015 is a high-precision etcher/asher that is designed for industrial and research use. This machine is capable of creating highly accurate and intricate patterns onto substrate materials. It is a dual-constituent etcher/asher, meaning it is capable of using either etching or ashing as the primary processing methods. CANON ILD 4015 utilizes an inductively-coupled plasma (ICP) chamber to create a high-temperature environment that is used to etch or ash the substrate material. The chamber has an integrated electron cyclotron resonance (ECR) magnetron, which further enhances the temperature and density of the plasma inside the chamber to ensure precise etching results. The etching and ashing times of ANELVA ILD 4015 can be adjusted to meet the specific needs of each application, as the process is highly tunable. The maximum processing area is 150mm x 150mm, making it suitable for a range of substrates with varying shapes and sizes. The integrated vacuum system allows ILD 4015 to maintain a highly consistent pressure during the etching and ashing processes. This ensures a more even distribution of etching on the substrate material, resulting in better quality end products. The machine is capable of being operated at a range of temperatures, from room temperature to as high as 900°C, enabling it to be used for a variety of processes including wafer doping, 3D structuring, and surface modification. CANON / ANELVA ILD 4015 also offers a range of other features, including accelerator control, controlled gas introduction, and automatic gas shutoff. These features help to further increase the accuracy of the etching and ashing processes, allowing for more precise control over the end result. CANON ILD 4015 is a high-precision, tunable etcher/asher designed for industrial and research use. Its integrated ICP chamber, ECR magnetron, and precision vacuum system enable it to etch and ash substrate materials with high accuracy and efficiency. The adjustable temperature range, accelerator control system, controlled gas introduction, and automatic shutoff features further enhance the machine's capabilities, making it highly suited to a variety of applications.
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