Used CANON / ANELVA ILD 4032 #9390492 for sale

CANON / ANELVA ILD 4032 is a type of dry etcher, also known as an Asher. This machine is used to etch patterns or shapes into a substrate. It works by using a subtractive process which is commonly used for complex fabrication or etching applications, thereby giving superior resolution over traditional mechanical drilling or milling. CANON ILD 4032 is powered by a high voltage RF source and utilizes a closed-loop process control system for precise etching control. ANELVA ILD 4032 has a compact design and is lightweight - making it suitable for laboratory and production environments alike. It has a built-in load lock chamber and a chemically-resistant solid-state target holder, which can both be autoloaded or manually operated. In addition, ILD 4032 offers the user the flexibility to use different substrates, such as glass, silicon, GaAs, polyimide, and other polymers. CANON / ANELVA ILD 4032 uses an inductively-coupled plasma (ICP) etching process. This process consists of applying an RF signal to a coil located above the working area, which then creates an induction field in the gas that is being utilized for etching. The inductively-coupled plasma allows for greater control over the etching process and as a result, offers a higher quality of etched features. In terms of performance, CANON ILD 4032 is capable of achieving resolutions down to 0.3 µm, which is suitable for precision etching applications. It also has a large etch area, covering up to 6.25 cm2 (3.1 inches), which makes it well-suited for production-level etching. ANELVA ILD 4032 can etch materials such as aluminum, copper, and other materials that require a higher etch rate. Aside from its etching capabilities, ILD 4032 is equipped with safety features such as low-voltage DC discharge prevention, arc detection, and O2 monitor lockout capability. These features help protect both the user and the machine, providing safe operation in etching or other processes. In summary, CANON / ANELVA ILD 4032 is an ideal choice for precision etching applications. It has a compact design, a lightweight construction, and features a chemically-resistant target holder that makes it suitable for both laboratory and production environments. CANON ILD 4032 uses an inductively-coupled plasma process that allows for greater control, resulting in higher quality etched features. It is also equipped with safety features that provide safe operation.