Used CANON / ANELVA ILD 4033 #9111258 for sale

CANON / ANELVA ILD 4033 is a complex reactive ion etching and atmospheric pressure dry etching (APDE) equipment that can provide precision analyses in multiple areas of research. This system is specifically used for etching of materials such as metals, semiconductors and other compounds. CANON ILD 4033 unit has an integral multi-level wafer/substrates handling machine designed to perform in an atmosphere of vacuum without the need of an additional handling and transport tool. The asset incorporates a spindle, a table, a robot arm and other components to rapidly and reliably load and unload wafers from the process chamber. This model also offers an optional nitrogen manifold for processing gas and wafer temperature control, integral wafer selection and clutch systems to precisely and safely handle wafers. ANELVA ILD-4033 equipment is capable of performing both reactive ion etching (RIE) and atmospheric pressure dry etching (APDE). It is equipped with an electrostatic chuck to hold the wafer securely and passes a plasma discharge between electrode rings. RIE processes are most commonly used to etch materials such as silicon, gallium arsenide and other compound semiconductors. The APDE process is commonly used to etch aluminum, metal-oxide-semiconductor (MOS) and metal-insulator-semiconductor (MIS) structures. For both RIE and APDE processes, ILD-4033 system offers an optional quartz retractor to maintain material uniformity and reduce etch symptoms. Additionally, the unit is equipped with a powerful, data logging control station that is also responsible for controlling the process parameters, monitoring the wafer temperature and allowing the user to manually override any process settings. This control station is fully compatible with recipe programming and allows for easy monitoring of wafer details in real time. CANON / ANELVA ILD-4033 is an incredibly powerful machine during the etching process, offering W/M, VO and O2 compatible processes and pressure, temperature and photoresist compatible processes as well. This tool's robust design and highly advanced components allow for etching ranging from sub-micron etching to deep etching on a wide range of materials. Overall, ANELVA ILD 4033 reactive ion etching and atmospheric pressure dry etching (APDE) asset is an incredibly advanced model designed to provide precise and reliable etching of metals, semiconductors, and other compounds. Utilizing a powerful control station for data logging and a comprehensive assortment of etching processes, this equipment offers world-class etching performance for research applications.