Used CANON / ANELVA ILD 4100 #293814342 for sale

CANON / ANELVA ILD 4100 is an etcher / asher for producing high quality patterns and tiny features on semiconductor substrates. It features a high power, high pressure, gas-phase etch equipment that helps achieve nanometer resolution etching. The system uses a chemically inert chlorine-containing gas (CCl2 F2) as its etching agent. CANON ILD 4100 etcher / asher includes an advanced etch-head design and a powerful operating unit. The machine includes a cavity equipped with electrodes, nozzle-capable magnets, and a dielectric window. This cavity enables two processes: first, it is designed to create a high potential gradient between the electrodes, accelerating ionized particles towards the substrate. Second, a powerful magnetic field is used to ensure that the etch gas flow remains centered across the substrate. The tool also uses high-voltage ac pulse power sources and fast data processing to quickly and accurately control the ionization and deposition processes. High-resolution digital patterning is enabled by the ability to program the etching parameters with a precision of 0.1 nanometer. The etcher / asher is also equipped with advanced source protection measures and multiple safety features to ensure the safe operation of the asset. The model can also be be operated by remote control. ANELVA ILD-4100 is an excellent etcher / asher for a range of applications and processes in nanotechnology. It is ideal for creating sophisticated patterns with nanometer resolution on substrates such as wafer, glass, ceramics, and other materials. It features a high-end equipment, with easy-to-use controls, and a compact design to make it space-saving and suitable for a wide range of applications.