Used CANON / ANELVA ILD 4100 #9262531 for sale

CANON / ANELVA ILD 4100 etcher/asher is an advanced Plasma Technology equipment designed for etching and ashing wafers, resists, polymers, dielectrics, and other materials used in the semiconductor industry. It is equipped with a chamber equipped with a plasma reactor, insulating plasma sheath and a nitride deposition system. The unit's ion source is a linear ion accelerator capable of accelerating ions of various materials up to speeds of 250 Volts per cm while at a reduced power level. The machine has a variable gas shower to provide a controlled environment for precise etching and ashing processes. Additionally, CANON ILD 4100 has a wide hydraulic chamber and a closed-loop, gas circulation tool, allowing the asset to maintain a constant ion concentration, while maintaining uniform etch and ashing depths. The model is well-suited for a variety of etching and ashing processes. These include trench etching, isolation etching, and surface passivation etching. It also works for surface profile modifications, such as shallow and deep laser annealing, surface treatment, layering, metal deposition and ion implantation. In addition, ANELVA ILD-4100 is capable of performing highly accurate etching and ashing processes, with high levels of reproducibility and repeatability. ILD-4100 offers an integrated ion beam implantation and photolithography equipment, allowing photolithographic processes to be carried out in-situ with the etching and ashing. The system's control unit is easy to use and allows operators to adjust various parameters to improve process results. The machine is also equipped with various safety features, such as an inert gas back-up tool, and other features to protect the chamber and asset components from contamination. The model is capable of supporting a wide range of gases, from nitrogen to xenon and oxygen. The equipment is also able to integrate with existing processes such as cleaning, chemical vapor deposition (CVD) processes, and other in-situ processes, providing compatibility with industry-standard procedures. ILD 4100 is capable of producing high-quality parts, with exceptional yields, without sacrificing production speed or cost. It is also highly reliable, durable, easy to maintain, and compatible with current industry practices and equipment. Overall, ANELVA ILD 4100 is an advanced etcher and asher system that is ideal for a wide variety of plasma etching and ashing processes in the semiconductor industry. It offers precise control, flexibility, and repeatability, as well as excellent safety features. Its capabilities mean it is one of the most dependable and user-friendly etching and ashing systems on the market.