Used CANON / ANELVA ILD 4100SDII #293821836 for sale

CANON / ANELVA ILD 4100SDII is an etcher/asher used in various industrial and scientific settings. CANON ILD-4100SDII utilizes a variety of ion beam techniques to etch and asher material surfaces on flat substrates such as wafers and MEMS (microelectromechanical systems). ANELVA ILD 4100SD II is a low-voltage ion beam system with a compact design that offers high reliability. It uses an ion source with a porous carbon cathode to generate a uniform beam of bombardment ions, which can be controlled with a stepper motor and applied to the substrate surface. The energy level of the ions generated can be adjusted from 60 to 400 V for etching and ashing thin films or bonded substrates. ILD 4100SDII's source block is also equipped with a variable speed rotary vane to regulate the beam intensities. Furthermore, the system includes a high-vacuum turbo-molecular pump, turbo rotation and ultrasonic vibration, and bakeout capabilities for application flexibility. CANON / ANELVA ILD 4100SD II offers a range of etching/ashing applications, such as oxide glass etching, resist stripping and cleaning, carbon removal, and removal of hard carbon films. It is also suitable for etching and ashing of silicon nitride, silicon dioxide, metals, polymers, titanium, nickel, etc. Additionally, it can be used for top-down anneal to rejuvenate or repair existing surfaces and structures. ANELVA ILD 4100SDII allows users to monitor the etching rate and depth in real-time, thus providing superior accuracy and repeatability over other systems. This helps to ensure efficient material processing with minimal waste, as well as reduce the risk of over-etching or under-etching. Additionally, the etcher/asher is easy to program and operate with its intuitive graphical user interface and remote device control. Overall, ANELVA ILD-4100SDII is an advanced etcher/asher with a wide range of applications. It offers superior accuracy and repeatability with its real-time monitoring of etching and ashing processes, as well as efficient material processing with minimal wastage. It also has a simple user interface, and comes with built-in features such as bakeout and turb rotation capabilities, making it a great choice for various industrial and scientific processes.