Used CANON / ANELVA ILD 4100SDII #9374947 for sale

CANON / ANELVA ILD 4100SDII is an advanced etching and ashing equipment designed to handle a variety of materials. This etcher/asher system includes a wide array of features, making it a great choice for use in a range of industrial and scientific applications. CANON ILD-4100SDII provides precision etching and ashing of surfaces, allowing users to accurately etch and ash a variety of substrates, including metals, semiconductors, polymers, ceramics, and other materials. ANELVA ILD 4100SD II incorporates an advanced integrated plasma etching/ashing chamber, which delivers remarkable precision and speed. This chamber features a large, textured shield plate, which is designed to reduce particulate contamination and ensure a high-quality surface finish. The etcher/asher also includes a high-resolution plasma source, which provides high-precision etching and ashing of materials, allowing users to create very fine patterns. ANELVA ILD 4100SDII also features a user-friendly interface, with an easy-to-use control panel and graphical display. This panel allows users to set the etching parameters and view the etch rate and etch depth in real time. In addition, the unit's Vacuum Gauge Pressure Meter continuously monitors the pressure inside the chamber, ensuring optimal compatibility with the material processed. ILD 4100SD II also includes advanced safety features, such as an emergency stop button, as well as options for automatic mode and/or manual mode operation. ILD-4100SDII also offers some benefits for periodic maintenance. The machine can be quickly disassembled and reassembled, allowing maintenance personnel to perform necessary tasks quickly and efficiently. ILD 4100SDII also features a pressure-controlled port, which easily allows for the replacement of parts as needed. This tool also offers full compatibility with a range of materials, including stainless steel, aluminum, and polymer. ANELVA ILD-4100SDII is a reliable and efficient etching and ashing asset capable of handling a wide variety of materials. Its advanced plasma chamber, user-friendly interface, and easy-to-maintain design make it a great choice for many industrial and scientific applications.