Used CANON / ANELVA ILD 4100SR #293758800 for sale

CANON / ANELVA ILD 4100SR is a high-performance ion etcher/asher that is used in semiconductor manufacturing. It is capable of etching with very high resolution and selectivity. CANON ILD-4100SR features a wide range of processes, with the ability to etch up to 8 inches wafers with a uniformity of +/- 10%, while the repeatability is within +/- 1%. The tool is ideal for high precision applications, which require a high degree of repeatability in terms of both time and material thickness. ANELVA ILD-4100 SR utilizes ion beam technology, allowing for etching of materials with little to no material loss. The process is also extremely efficient, with a low resource consumption and low residual stress. The equipment can be programmed with various parameters, such as the etch time and beam current, in order to produce an optimized etch for each application. CANON ILD 4100SR also features a nitrogen enclosure to help maintain a low particle count, a high-vacuum chamber, and a shutter system to minimize etching outside of the mask area. It also uses a patented gas filtering unit that is capable of removing O2, N2, and CxHx (x being a number) molecules from the process chamber. This filtration process helps to ensure a high surface smoothness and perfect finishing of parts. The etch rate of ANELVA ILD 4100 SR can be modulated via its two-frequency settings, enabling fine-tuned etching. The machine can also display a real-time image of the process, allowing for the immediate feedback of results. This helps to ensure consistent, accurate etching and ashing results. ANELVA ILD-4100SR also comes with a range of special functions, such as high-vacuum pumping, low-residual stress plating, zinc cast formation, and W mode doping. These additional features are designed to provide a larger scope of applications, such as the plating of contact openings on a wafer, or the formation of a layer on a quartz wafer. CANON / ANELVA ILD-4100SR is a high-end ion etcher/asher with a number of unique features. Its technological capabilities are designed for precision and high-yield manufacturing, and its additional special functions grant it more flexibility. Together, these components make a powerful tool for the etching of semiconductor materials.