Used CANON / ANELVA ILD 4100SR #293821838 for sale

CANON / ANELVA ILD 4100SR is a high performance etcher and asher that is specifically designed for advanced photomask etching and ashing operations. It has been developed to meet the needs of modern fabrication processes for advanced mask fabrication. CANON ILD-4100SR features a unique thermal management equipment and patented technologies that enable it to achieve high etching and ashing rates while preserving the shape and features of complex photomask patterns. ANELVA ILD-4100 SR is a highly efficient etcher/asher that produces clean, repeatable, and consistent photomask etching and ashing results. Its unique thermal management system and patented technologies enable it to reach high etching and ashing rates without sacrificing pattern integrity or damage to the substrate. With its advanced photomask pattern etching capabilities, ILD-4100SR enables the creation of high performance and high precision photomasks for advanced semiconductor production processes. CANON / ANELVA ILD 4100 SR features advanced automation capabilities such as Process Monitoring and Data Acquisition functions, to ensure that all etching and ashing processes are optimized and parameters adjusted within a wide window of acceptable values. Additionally, it has advanced diagnostics and recalibration functions that enable it to quickly diagnose problems and errors, as well as automatically recalibrate to avoid unnecessary rework. ILD-4100 SR also features a dual-chamber design for highly efficient, uniform etching and ashing processes. Its advanced etching and ashing process control unit is capable of adjusting etching and ashing parameters such as etching and ashing time, etching and ashing temperature, oxygen pressure, and etching and ashing fluid temperatures. This enables CANON ILD 4100 SR to perform etching and ashing operations in a wide variety of materials including metals, plastics, ceramics, and graphite. To ensure maximum precision and repeatability during etching and ashing processes, CANON / ANELVA ILD-4100 SR features a highly precise mask stage that is equipped with micrometer and camera coordinate systems, allowing for highly accurate support manipulation. Additionally, it utilizes a wide range of power supplies ranging from low to high voltages to achieve the best possible results. Overall, CANON ILD-4100 SR is an effective and reliable etcher/asher that is capable of achieving maximum precision and repeatability during photomask pattern etching and ashing processes. With its advanced thermal management machine, patented technologies, advanced automation capabilities, dual-chamber design, and precise mask stage, ANELVA ILD 4100 SR is the ideal solution for advanced photomask fabrication.