Used CANON / ANELVA ILD 4100SR #9161261 for sale

CANON / ANELVA ILD 4100SR is a state-of-the-art etcher / asher for the fabrication of microelectronic devices. It combines advanced ion-beam etching and shallow anisotropic etching technology to enable a wide range of etching parameters. CANON ILD-4100SR is designed to produce uniform, clean and precise etches that can be used for a wide variety of microelectronic device fabrication processes. ANELVA ILD-4100 SR has a fixed forward-base structure design that ensures minimal maintenance requirements. It is made of stainless steel and its exterior is resistant to corrosion and easy to clean. The etching chamber is designed specifically for etching and ashing processes and is equipped with a high-precision positioning system. The chamber has a chamber size of 200mm x 200mm x 80mm and can support both atmospheric and vacuum etching conditions. ANELVA ILD-4100SR is capable of etching materials with a wide range of etching parameters such as ILD (Inductively Coupled Plasma), CF4, SF6, and CCl2F4. It supports both reactive ion-beam and ion-beam induced etching. It is capable of achieving etching rates greater than 1400 nm/min and is capable of etching different shapes with different profiles. CANON ILD-4100 SR is highly reliable and has a wide range of process control features. It can be preset to control the ion beam currents, gas pressure, etching time, and substrate on and off times. It also features integrated process diagnostics which help ensure etching uniformity and repeatability. CANON / ANELVA ILD 4100 SR is also equipped with a laser aligner which can remotely adjust the intensity of the ion beam pattern and verify the alignment of the etch pattern. An infrared thermal imaging system can measure the temperature of the etch surface and provide feedback to the operator for improved etching results. ILD-4100 SR has a robust, highly reliable design, and is capable of producing accurate and precise microelectronic device etches. Its easy-to-use features and integrated process diagnostics help ensure reliable and repeatable etching results.