Used CANON / ANELVA ILD 4100SR #9227371 for sale

CANON / ANELVA ILD 4100SR
ID: 9227371
Wafer Size: 8"
Oxide etchers, 8".
CANON / ANELVA ILD 4100SR is a critical dimension scanner etcher/asher designed specifically for mass production. It is a highly precise and reliable machine with a unique infrared vision equipment that enables rapid and accurate measurement of surface, line width, or notch patterns, making it ideally suited for semiconductor applications. CANON ILD-4100SR is a vacuum etcher/ asher, allowing for the removal of materials up to a predetermined depth with tight control over the etching rate. Its precision is accomplished by controlling the rate of material removal rather than relying on chemical etching, commonly used in etcher/ ashers. ANELVA ILD-4100 SR features a two-stage charging system, wherein the first stage charges the secondary electron gun and the second stage charges the infrared vision unit. This charging machine allows for precision settings and control over etching rates. Additionally, an inductively coupled plasma technology (ICP) is used to remove materiel uniformly and without any abrasion. CANON ILD 4100 SR can also be used in the fabrication of MEMS (microelectromechanical systems) components for applications in chip-based microprocessors, biosensors, and diagnostic applications. In MEMS fabrication, the machine is capable of creating ultra-fine channels and cavities to less than 1 micron in depth. The machine has also been designed to work with a range of etching materials, including silicon, polysilicon, silicon oxide, aluminum, and III-V compounds. A strong focus on safety and environmental protection is evident in this etcher/ashers design, with a large range of safety and exhaust features, including interlocks, hazardous gas neutralizers, and variable-speed exhaust fans. CANON ILD-4100 SR is also highly effective in advanced etching and in feature size reduction applications. This is achieved through the use of specific parameter settings, allowing for precise control over the etching process and the results achieved. In conclusion, CANON / ANELVA ILD 4100 SR is a sophisticated etcher/ashers tool designed for mass production semiconductor applications. Its flexibility and adaptability make it suitable for a wide range of processes, as well as for microelectromechanical systems fabrication and advanced etching and size reduction applications. Its strong safety and environmental features make it ideally suited for use in both controlled and hazardous environments.
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