Used CANON / ANELVA ILD 4100SR #9292593 for sale

ID: 9292593
Wafer Size: 8"
Vintage: 1996
Oxide dry etcher, 8" 1996 vintage.
CANON / ANELVA ILD 4100SR is a versatile Dry-Etching Asher designed to provide high precision etching for a wide range of applications. CANON ILD-4100SR can process both organic and inorganic materials, and covers both flat and complex surfaces with high accuracy and repeatability. Its features include a high-frequency discharge power supply, which ensures an excellent etching efficiency and accurate cutting of fine features. It also has a powerful bombardment gun, equipped with a 5 kW inductively coupled discharge to ensure superior etch quality and reproducibility. ANELVA ILD-4100 SR also has a 10-stage adjustable gas flow equipment, allowing the user to obtain precise control over the etching parameters. CANON / ANELVA ILD 4100 SR includes a host of sophisticated features like multi-axis movement, auto-monitoring of the etching conditions and process control. Its microprocessor-based monitoring system ensures that the conditions are held within precise tolerance levels, and that the etching process is highly repeatable. ILD-4100SR also includes a graphical interface to allow users to fine-tune the etching parameters. ILD 4100 SR also has a built-in programmable application unit, which can help automate the etching process for large runs or difficult applications. Additionally, it also has an overload protection machine, ensuring that the etching process remains safe and efficient. CANON ILD 4100SR is suitable for working with a wide variety of materials like silicon, quartz, aluminum, polyimide, and many others. It is also capable of providing excellent definition and smoothness on flat or profiled surfaces. ILD-4100 SR's high accuracy and repeatability make it an excellent choice for applications such as micro-fabrication, LDS, advanced motor manufacturing, medical device manufacture, IC processing and more. CANON / ANELVA ILD-4100 SR is an excellent choice for many etching applications. Its combination of high accuracy, repeatability, and intuitive control systems make it an excellent choice for modern etching applications. It is a powerful, reliable and cost-effective solution for a wide variety of etching needs.
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