Used CANON / ANELVA ILD 4100SR #9374944 for sale

CANON / ANELVA ILD 4100SR is an etcher/asher equipment designed for various types of physical etching and ashing process applications. It is a high-performance etching/ashing system which uses an inductively coupled plasma (ICP) source to induce a plasma. This plasma is then used for the etching and ashing of wafers of various types and sizes. CANON ILD-4100SR is capable of processing up to 8 x 8 inch wafers. ANELVA ILD-4100 SR is a unit which features a multi-stage gas control structure for precise etching and ashing of the wafers. This machine features a 3-zone gas control unit which gas control zone is used to ensure stable etching and ashing results. The gas control unit also helps to reduce the generation of particulates within the etching/ashing chamber. CANON / ANELVA ILD-4100 SR utilizes an Optically Actuated Splash Protection Tool (OAP) to protect substrate and components by reducing the risk of sparks interacting with other components. This asset helps to ensure that deposition and etching occur in the optimal environment and that any critical area or sensitive components are not damaged. ILD-4100 SR model also features a Closed-Loop Experiments for ultra-precise parameter tracking. This allows users to experiment with process control parameters quickly and accurately even during actual process runs, allowing users to make the best of their etching and ashing process results. CANON ILD 4100 SR is a stand-alone equipment which features an automated loading and unloading system to help streamline the etching and ashing process. This automated unit helps to reduce processing and setup time and helps to ensure that the wafers are etched and ashed in the most optimal conditions. Overall, ILD 4100 SR is a high-performance etcher/asher machine designed for various types of physical etching and ashing process applications. This tool features an ICP source, a 3-zone gas control unit, Optically Actuated Splash Protection Asset (OAP), a Closed-Loop Experiments feature, and an automated loading and unloading model for optimized etching and ashing process results.