Used CANON / ANELVA ILD 4100SR #9398262 for sale

CANON / ANELVA ILD 4100SR etcher is an advanced ion etching device used for the precise production of high-performance semiconductor components. This equipment is designed for direct ion injection to achieve highly precise etching of materials such as silicon, aluminum and other substrate materials. CANON ILD-4100SR features a large vacuum chamber with high-precision pumping system, dual source ion source, three-stage wafer carrier system and a computer-controlled plasma panel. It is suitable for etching of both planar and nonplanar geometries with a feature size down to 0.1µm and a depth of 0.2 µm. ANELVA ILD-4100 SR is equipped with independently controlled robot arms and a heat-resistant nozzle to ensure consistent and uniform etching. The robot arms ensure precise and repeatable motions, while the nozzle is made of high-temperature materials to prevent damage during high-temperature processes. The nozzle has an adjustable guided focus that prevents overlapping of the ion beam and substrate surface during the etching process. This helps produce high-quality results with minimal wafer damage and consistent etching characteristics. ANELVA ILD-4100SR also features a high-speed beam shutter for controlling the length of the etch. This ensures shorter cycle times without sacrificing quality or performance. Additionally, shielding plates in the etching chamber can be adjusted to help eliminate secondary ions from entering the working area during the etching process. This prevents the formation of unwanted residues that can hinder the desired etching characteristics. ILD-4100 SR also features advanced process monitoring functions such as parameter protection mode, extremely low current monitoring and feedback loop controller. This ensures the highest etching accuracy and repeatability. Furthermore, CANON ILD 4100 SR is equipped with an ultra-low noise chamber to reduce electromagnetic interference and provide a safe operating environment. Overall, ILD-4100SR is an advanced etcher/asher offering superior performance and accuracy. The combination of robotic arms, adjustable nozzles and parameter protection mode helps deliver consistent etching results while reducing cycle times. Additionally, this system also provides advanced process monitoring to ensure the highest etching accuracy and repeatability.