Used CANON ANELVA ILD-4100W #9158758 for sale

CANON ANELVA ILD-4100W is a high precision wafer etcher / asher designed to perform advanced etching and ashing processes. This process yields precise control over the layer thickness and feature size of the etched results. ILD-4100W employs advanced ICP (Inductively Coupled Plasma) technology to precisely control the reaction parameters for a wide variety of substrates. The system features strong robust construction and a unique easy-to-operate design that ensures high-speed operation and easy maintenance. The device consists of an ICP source, an electrode, and wafer support. The ICP source powers the plasma by an RF signal. This results in an intense plasma discharge that is advantageous for etching wafers with sub-micron feature sizes. The ICP source also offers a wide range of power levels that can be easily adjusted to fine-tune the etching properties. The electrode functions as the primary electrode to which the RF voltage is applied. It generates the original etching path onto the substrates being processed. Lastly, the wafer support holds the substrates in place in the system while the etching process takes place. The Anelva CANON ANELVA ILD-4100W also offers precise control over etching speed and consistency, as well as the etching selectivity. This makes it ideal for a wide variety of demanding applications such as MEMS fabrication, semiconductor production, PCB processing, as well as precision wafer manufacturing. The device is capable of processing both single-wafer and multiple-wafer substrates and is adaptable to a variety of materials including aluminum, silicon, ceramics, metals, and more. Furthermore, ILD-4100W can be configured with a variety of additional components such as a gas box, a vacuum box, a gas sensor, a single wafer transfer chamber, a duplex chamber, a gas filter, and more. These additional components allow users to further customize the process to meet their needs and requirements. Additionally, the system features an intuitive LCD screen that allows for easy operation and monitoring. CANON ANELVA ILD-4100W is an excellent choice for those who need a precise, reliable etcher / asher for industrial and academic applications. Its advanced technological features ensure high-performance results in either single-wafer or multiple-wafer operations. This makes it an ideal choice for many industry and academic applications requiring high-precision etching and ashing processes.