Used CANON / ANELVA PED-301 #9284059 for sale

CANON / ANELVA PED-301 etcher / asher is a dry SD-308V vapor gas diffusion etcher designed for fabrication of electronic components or micro-structured components. CANON PED-301 is ideal for use in a semiconductor manufacturing environment and provides high yields of uniformity and consistency. ANELVA PED-301 has a dual single-wafer processing chamber. Each chamber is capable of delivering a precise exposure of etching materials such as silicon, glass, and silicon nitride. The dry etching process operates by creating highly energetic ions which interact with the material surface to remove material atoms. PED-301 uses controlling parameters such as gas type, temperature, pressure, so that materials are removed in a controlled and uniform fashion. CANON / ANELVA PED-301 is equipped with advanced vacuum control options including a mass flow controller, clean working environment and an in-situ gas purification equipment, ensuring a clean etching environment. The etching process is also monitored and controlled through an in-built monitor system, allowing operators to track and adjust process parameters. CANON PED-301 comes with a remote control terminal, allowing users to remotely control settings, as well as adjusting set exposure and etching times. ANELVA PED-301 is also equipped with sensors for both temperature and pressure, giving users precise control over the parameters used during the process. PED-301 can be configured with a variety of accessories to suit production requirements. These can include additional gas sources, gas lines, and a remote exhaust unit. The etcher can also be configured with an optional material weighing machine to ensure precise processes. CANON / ANELVA PED-301 etcher / asher provides a reliable and cost-effective etching solution for production needs, producing uniform and consistent results. CANON PED-301 has a long life span and requires minimal maintenance, making it an ideal etching solution for the semiconductor industry.