Used CORIAL 300 iL #9272964 for sale

CORIAL 300 iL is a state-of-the-art dry plasma etcher / asher ideal for advanced micro- and nanoscale device structuring. It features a unique dual-beam architecture that enables simultaneous etching/crystallizing of 2 independent substrates. 300 iL is the perfect tool for high aspect ratio structuring in semiconductors, dielectrics, resists, oxide layers, and solar cells. Its unique dual-beam architecture consists of two source chambers, each of which is isolated from the other yet connected to the same vacuum chamber. Each source chamber has a different source gas - one for etching and one for crystallizing, depending on the process at hand. The two gas sources are pumped through a pair of multi-stage high vacuum pumps, which creates ultra-high vacuum pressure(UHV) levels and ensures high process repeatability. CORIAL 300 iL uses a RF (Radio Frequency) generator to supply the excitation energy for the ionization of the beam. This RF generator is highly stable and can be set up to operate at either a high power (2 kW) or lower power (400 W) mode, depending on your process requirements. 300 iL offers a wide operational range for source gas composition, and can be used with any type of process gas. CORIAL 300 iL is equipped with an advanced equipment of sophisticated control electronics that allow for precise adjustment of etch time, repeatability, and precision in etching depth and feature size. The temperature of both the substrate table and sources stations can be set to an appropriate level to ensure precise temperature control across the entire device structure. This makes 300 iL well-suited for processes like ultra-thin film deposition, as well as materials growth and diffusion processes. Furthermore, CORIAL 300 iL has a built-in safety system to ensure the safety of both operator and unit. In the event of an emergency, the machine automatically shuts down and all remaining material in the vacuum chamber is safely evacuated before the tool can be restarted. 300 iL is an optimal choice for advanced etching / structural applications and is suitable for all research, development, and production processes. This powerful device is designed to provide high-precision etching and crystallizing with outstanding repeatability and stability, and is sure to be a valuable addition to any cleanroom facility.