Used DNS / DAINIPPON SPW-612 #9018575 for sale

DNS / DAINIPPON SPW-612
ID: 9018575
Wafer Size: 6"
Vintage: 1989
Au etcher, 6" 1989 vintage.
DNS / DAINIPPON SPW-612 is an etcher and asher equipment used for precision etching and ashing tasks. This system is ideal for rapidly ashing and etching substrates such as Silicon Wafers, Gallium Arsenide Wafers, and other semiconductor substrate materials. The unit includes a 12inch wafer chuck rotating home, two electro-magnetic actuators that are capable of XYZ motion, and a process gas supply. The machine is designed to operate with a process gas of either Argon or Nitrogen provided by a GFS-1000 gas supply tool. The asset is controlled by a Cerberus SH 1000 NXT PLC-based software which is used to program automated processes, allowing the user to matrix pattern multiple substrates. The model is also equipped with a wet etch process which uses a dilute hydrofluoric solution to uniformly etch the substrate. This allows for highly accurate etching without reliance on manual processes. The equipment also uses an electro static load clamping mechanism, which securely holds the substrate in place while it is processed. This ensures that the wafer does not become dislodged during processing. The system also features a process exhaust blower, which is designed to reduce particle contamination. DNS SPW-612's ashing and etching systems are capable of producing as small as a 1 micron pattern size with a superior level of etch uniformity. The unit is highly reliable and has been designed to reduce waste and save time for the operator. The machine is also capable of throughputs of up to 200 wafers per hour and is suitable for production scale etching and ashing tasks. The tool has also been designed to reduce EMI emissions. Overall, DAINIPPON SP-W612 is a highly reliable, precision controlled etcher and asher asset suitable for a wide range of applications. It is capable of providing highly accurate, uniform etching and ashing with a level of precision that cannot be achieved via manual processes. This model can reduce waste, time, and EMI emissions in the production process, making it ideal for etching and ashing tasks.
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