Used DNS / DAINIPPON SPW-813A #9256956 for sale

DNS / DAINIPPON SPW-813A is an etcher / asher equipment utilized in semiconductor manufacturing. This device offers superior results when used for etching, anisotropic etching, plasma etching, reactive ion etching and plasma enhanced chemical vapor deposition (PECVD). It is designed to operate with four chambers, enabling users to switch etching processes quickly and efficiently. DNS SP-W813-A comes equipped with multi-gas introduction chambers, allowing users to choose the appropriate process gas depending on the material etched. The chamber is equipped with four mass flow controllers and two heating elements, allowing users to regulate the gas flow rates and temperature. In addition, DAINIPPON SPW-813-A has a computer-controlled pump, allowing for precise timing and pressure for a variety of etching processes. DNS / DAINIPPON SPW-813-A is also an efficient system for anisotropic etching, with an integrated double quartz resonance frequency controller for high-precision control of the etching process. This unit also allows for precise control over the etching power through a computer-controlled power supply. DAINIPPON SP-W813-A's unique design includes a spacer separating the upper and lower quartz crystal plates, allowing for a uniform etching with minimal erosion. DNS / DAINIPPON SP-W813-A is also equipped with a choice of five different plasma etching processes, making it ideal for fabrics that require both high selectivity and high throughput. These processes are plasma etching with ion implantation, pure ionization dry etching, ionized gas mixture dry etching, wet etching with modified and stable gas mixture, and 15 volt plasma etching. DAINIPPON SPW-813A also features computer-controlled phase etching, which controls the phase of the electromagnetic field to increase the process efficiency and uniformity. Finally, DNS SPW-813-A is highly adaptable for plasma-enhanced chemical vapor deposition (PECVD) processes. This state-of-the-art machine is equipped with an integrated RF and DC power supply, allowing users to quickly switch between the two and customize the deposition process. Additionally, DNS SPW-813A is compatible with a variety of gases, allowing for precise selection of deposition gas ratio and pressure. DNS SP-813A is a top-of-the-line etcher / asher tool for semiconductor manufacturing that is capable of precision etching, anisotropic etching, plasma etching, reactive ion etching and PECVD processes. Its adjustable, multi-gas introduction chambers, integrated double quartz resonance frequency controller and choice of five plasma etching processes make it a versatile and efficient tool for etching. Additionally, its computer-controlled power supply and choice of deposition gases give users a great deal of control over the deposition process.