Used E&R Plasmax-1000N #293653208 for sale

E&R Plasmax-1000N is an etcher / asher equipment specifically designed for a range of substrate preparation, etching and underetching applications. It uses an advanced plasma-source technology to create a wide range of precise and repeatable plasma process conditions, enabling the precise control of a range of parameters, including temperature, pressure, flow and electrolyte concentrations. Plasmax-1000N is composed of two main components—an ion source and a processing chamber, both of which are contained in a single, compact cabinet. The processing chamber utilizes an advanced electrostatic discharge (ESD) technology for precise etching and ashing of substrates. The ESD technology produces an electrostatic, non-contact source of ions, allowing for precise control of the plasma-generated process conditions, from temperature and pressure to species and reactant concentration. In addition, E&R Plasmax-1000N is capable of producing high-resolution, fine-feature etching, with features down to 100nm, allowing for precise patterned etching and selective ashing processes. Plasmax-1000N is capable of accommodating a wide variety of substrates, including quartz, glass, silicon, and other materials. It also includes advanced plasma-based technologies such as ion-implantation, ion-sputtering, and gas-phase etching, as well as a patented plasma-shielding technology. This patented technology enables the system to operate in an ultra-high-cleanliness environment, providing superior substrate preparation, etching and underetching processes. E&R Plasmax-1000N is an efficient and reliable tool for micro- and nanofabrication applications. It is easy to use, and its well-designed user interface allows for precise control of the process parameters. The chamber is self-contained and fully enclosed, providing a high degree of safety during operation. In addition, Plasmax-1000N offers energy-efficient operation, utilizing a low-energy, low-pressure plasma source for most applications. Overall, E&R Plasmax-1000N is an advanced etcher and asher unit, designed for demanding substrate preparation, etching and underetching applications. It offers precise, repeatable, and predictable plasma process conditions, enabling the precise control of various parameters. The ESD technology, advanced plasma-based technologies, and patented plasma-shielding technology enable the machine to produce high-resolution etching and selective ashing processes, while the self-contained chamber and user interface ensure safe and efficient operation.