Used E&R Plasmax 602A #9217454 for sale

E&R Plasmax 602A is an etcher and asher used in the semiconductor processing industry for deposition and etching of thin film materials. This industrial-grade tool utilizes a coaxial plasma source to achieve high-quality, repeatable results. The equipment has an electron-cyclotron resonance (ECR) technology based, inductively-coupled, coaxial double-waveguide plasma source which provides flexibility in controlling the power requirements to match product needs. In addition, the ECR shields cause minimal electrical interference with neighboring tools, while featuring excellent temperature control and efficiency that enables reliable process results. The ECR-source based system allows for plasma-assisted desmear function for removing resist residues from the substrate's surface. The tool also features "Cr-Blocker Plate" design, which prevents Cr-containing particle release in the process chamber so that no additional environment contamination occurs. Chemical oxide removal can also be achieved with this tool and a variety of chemicals are used depending on the oxide type that needs to be removed. For etch-rate control, Plasmax 602A is equipped with a combination of RF frequency scanning and axial biased-magnetron technologies to generate a wide range of precise power levels for etching different materials. Additionally, integrated closed-loop feedback controls assure accuracy and repeatability of the process. The unit is capable of processing 200mm wafers with an ability to extend processing to 300mm wafers in the future. This tool also features a process-gas delivery machine with dual-fan bubbler and thermal asymmetric shower control, ensuring uniform gas flow, as well as reliable gas pressure and temperature stability that enables more uniform etching processes. E&R Plasmax 602A is suitable for various oxide etching and desmear processes for high-precision, high-yield products. This tool is known for its reliability, accuracy, and cost-efficiency helping to maximize production yields in the semiconductor processing industries.