Used E&R Plasmax 800C #9364455 for sale

E&R Plasmax 800C
Manufacturer
E&R
Model
Plasmax 800C
ID: 9364455
Vintage: 2012
Plasma cleaning system 2012 vintage.
E&R Plasmax 800C is an Etcher / Asher designed for plasma ashing, etching, stripping, and trim etching of submicron device geometries. The 800C is capable of processing both oxide and non-oxide films, with submicron-sized features, and can process substrates of up to 400mm in diameter and up to 30mm thick. The etcher/asher is equipped with a plasmax generator and a fast, automated load/unload equipment. It is compatible with a special vacuum-seal design, creating a vacuum of 10-5-10-7 Torr (Torr is a unit of pressure). The 800C is designed to etch at low temperatures (up to 150°C) and is thermally insulated around the core system to counteract the effects of thermal shock. Plasmax 800C's process chamber can be configured for either oxide or non-oxide materials. It offers a variety of etching capabilities ranging from etching with cold oxygen plasma to reactive ion etching. The chamber also includes a four-level showerhead design, which provides more uniform etch rates on large substrates. Additionally, the etcher/asher is equipped with a glass-ceramic viewing window with a quartz lens, so users can monitor etching processes, and adjust parameters accordingly. E&R Plasmax 800C includes an advanced configurable plasma process, capable of controlling gas flow, as well as other parameters, including pressure, temperature, and etching time. The etcher/asher also offers automatic process control, allowing users to set up the desired parameters and receive automatic feedback on the unit's performance, while minimizing time-to-process. The chamber is designed for easy maintenance, and can be equipped with maintenance kits for easy maintenance and troubleshooting. Plasmax 800C is a reliable and efficient etching/sintering machine, making submicron device geometries a breeze. Its fast, automated load/unload tool and advanced process control capabilities make it the perfect choice for a variety of processes, from etching to plasma ashing. Its low temperature etching and highly configurable process ensure reliable performance and efficient results.
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