Used ESC ELAS #9156747 for sale

Manufacturer
ESC
Model
ELAS
ID: 9156747
Wafer Size: 4"-8"
PVD System, 4"-8" Sputter down cassette to cassette Standard BROOKS Robot system CTI Cryo pump main chamber, 10" CTI Cryo load lock, 8" Turbo pump / Rotary pump ADVANCED ENERGY Pinnacle DC MAGNETRON Power supply ADVANCED ENERGY RFPP RF20S Power supply Techware II Ultra (3) Targets plus RF etch station: 20.25" x 4.75" Dual level load lock Bulkhead mounting maximum substrate size (Through-wall): Large area substrates: Up to 16" x 16" MRC 943 PVD System Batch size: (4) Wafers, 8" (6) Wafers, 6".
ESC ELAS (short for Electrostatic-Lithographic-Asher) is an advanced etching and ashing machine developed by Esterline Corporation. ELAS is designed to deliver reliable and repeatable results, for both prototyping and high-volume production applications. ESC ELAS is a modular etching and ashing equipment, comprised of three connected units: the iMix, iControl, and the iX-max. The iMix provides the necessary chemistry for etching and ashing, while the iControl is a controller for the etching and ashing processes, allowing for precise control of the process, and data acquisition. The iX-max is a high-precision x-axis motion control system that helps automate the etching process. ELAS operates using electrostatic lithography technology. This type of lithography utilizes an etchant solution which, when exposed to a previously patterned substrate, removes unnecessary material, leaving only the desired feature etched onto the surface. The result is higher precision etching than can be achieved using traditional wet etching processes. ESC ELAS is capable of etching and ashing a variety of materials, including copper and other metals, as well as dielectrics and semiconductors. ELAS offers excellent resolution and patterning for micron-level features, depending on the substrate and chemistry used. It is also a highly flexible machine, allowing for a range of etching and ashing processes that can be tailored to exact user requirements. ESC ELAS unit includes an integrated metrology machine, providing both inspect and monitor the substrate before, during, and after etching and ashing. The integrated metrology module allows for repeated fast scans of the wafer for non-contact and nondestructive measurement. Further, ELAS is designed to be user-friendly, allowing operators to manipulate process settings from a touch screen or remote computer using an intuitive graphical interface. Overall, ESC ELAS is a reliable and effective etching/ashing machine designed to deliver highly accurate and precise results. It is a versatile machine equipped with advanced technologies and integrated metrology, ideal for both prototyping and high-volume production applications.
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