Used EUROPLASMA CD300 PLC #9409746 for sale
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ID: 9409746
Vintage: 2007
Plasma treatment system, parts machine
ALCATEL ACP 28G Vacuum pump
2007 vintage.
EUROPLASMA CD300 PLC is a plasma etcher/asher equipment designed for advanced plasma treatment applications in the semiconductor, optoelectronic, MEMS, and solar cell industries. This system features an intuitive touch screen interface for optimizing the process parameters, improved safety features, and a patented single slot unit for auto loading and unloading of various types of substrates. CD300 PLC has a large plasma chamber (915 mm x 690 mm x 795 mm) with two side ports that can be used for sample transport and remote plasma monitoring. EUROPLASMA CD300 PLC is a high power, radio frequency (RF) driven, plasma etching/ashing machine that can process substrates up to 300mm in diameter. This tool employs highly efficient, low-temperature chemical reactions that allow for precise and repeatable chemical etching and ashing. The process pressure and RF power are dynamically adjustable and can be tuned for specific applications. CD300 PLC also features an automated quality control asset that monitors each plasma treatment process. The process parameters including substrate temperature, process time, plasma density, and chemical composition can be monitored in real-time and monitored in a log file for future reference. The model also includes a proprietary Automated Sample Loader that can integrate with a robotic transport equipment to facilitate full automation of the process. The etching/ashing process is carried out in a completely sealed environment and all process gases are monitored and kept at optimal concentrations. In addition to the high-efficiency plasma etching and ashing, EUROPLASMA CD300 PLC can be used for plasma surface cleaning, passivation, and deposition processes. The safety features include a full zone interlock with lightning protection and shielding to protect against process contamination and personnel hazards. Additionally, the system is equipped with a high-efficiency residual gas analysis unit and process monitoring machine that allow for pinpointing of process fluctuations. Overall, CD300 PLC is a powerful plasma etching/ashing tool that provides precision control and reproducibility for advanced plasma treatment processes. The large chamber size, automated sample loading, safety features, and remote monitoring make it an ideal choice for various plasma treatments.
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